Equipment Specifications
Substrate Size: Standard Size: 200mm Dia (8 inch) (Customizable)
Process Temperature: Temperature Range: RT~500°C (Customizable)
Pilot Line Configurations: Up to 6 pilot lines supported ( customizable ), including solid and liquid precursor source bottles
Heating System: Temperature Range: RT ~ 150℃
Reagent Paths: Supports 2-way reagent gas paths ( customizable )
Carrier Gas: Standard: N2 MFC Flow Control (Customizable)
Plasma System: Supports 4 plasma gas channels ( customizable)
RF Power: 0~1000W
Pressure Monitoring: Dual-membrane gauge assembly (corrosion-resistant), 0.005Torr - 1000Torr
Base Vacuum Level: <5x10-3 Torr Torr
Vacuum System: Standard Oil Pump
Control System: 19-inch monitor, touch-enabled industrial-grade embedded industrial computer, high reliability, expandable
Operating System: Windows 7, Industrial-grade Programmable Logic Controller, supports Fieldbus and Real-time Multitasking Operations
High-Temperature Heating Module: Independent source bottle heating module, supporting RT to 200℃
Process
Types and application scenarios of degradable film include:
• High-K Dielectric MaterialAl2O3, H2O, ZrO2, PrAlQ, Ta2O5, La2O3);
• Metal interconnect structures (Cu, WN, TaN, Ru, In)
• Catalyst Materials (Pt, Ir, Co, TiO2):
• Biological coating (TiN, ZrN, TiAIN, AlTIN)
• Metal (Ru, Pd, Ir, Pt, Rh, Co, Cu, Fe, Ni)
• Piezoelectric layers (ZnO, AIN, ZnS)
• Transparent electrical conductors (ZnO:Al, ITO)
• Photonic Crystal (ZnO) TiO2, Ta3N5); etc.
Rack
•The frame is constructed with imported aluminum, featuring light weight, high load-bearing capacity, and excellent heat dissipation.
• The housing is made of carbon steel with baked paint and rounded corners, lightweight and aesthetically pleasing, easy to disassemble, and ergonomically designed.
• The display screen rotates 360 degrees freely, adjustable viewing distance, angle, and free hovering
Control System
The control system is implemented using a PLC, industrial computer, and 19-inch touch screen, with communication via high-speed Ethernet.
• The equipment is controlled in real-time with PLC, while offering interactive human-machine interface based on Windows 7 operating system. It supports the storage and import/export of historical data, process recipes, alarms, and logs.
• The equipment supports a "one-click deposition" function, simply click the run button to automatically complete a series of steps including vacuum extraction, temperature increase, material deposition, and cooling. Achieves deposition of single or multi-layer materials; provides an independent manual operation page, supporting manual operation of valves, with human-machine interaction that supports mouse, keyboard, and touch input methods.
• The equipment's operating software provides user permission management features, allowing usage permissions to be set according to user levels, preventing erroneous operations, and ensuring equipment and personal safety.
• The equipment's operating software provides a logical interlock function to prevent user errors and pops up an information dialog box for prompts.
• Equipment operation software integrates security and parameter configuration, as well as I/O interlock list information functionality.
Vacuum System
• Vacuum measurement employs a combination of dual vacuum gauges, providing more authentic, quicker, and more precise process data. It offers well-verified data collection sources for process personnel, ensuring reliable guarantees for the reproducibility of the process.
Application Fields
Nano materialsALD technology offers highly controllable deposition parameters, enabling atomic-level precision in thin film formation and growth on complex three-dimensional micro-nano structures of various sizes. It can produce nanometer-scale films with high uniformity, precision, and shape retention. ALD boasts high density and uniformity in longitudinal and transverse ratios, providing optimal solutions for MEMS mechanical wear-resistant layers, corrosion-resistant layers, dielectric layers, hydrophobic coatings, biocompatible coatings, and etching mask layers. The ALD deposition parameters are highly controllable, allowing precise control of the number of cycles to achieve the required parameters for MTJ manufacturing, making it one of the best process solutions for MTJ production. ALD technology can improve the biocompatibility of nanopores through surface modification, while enhancing antibacterial properties and promoting cell synthesis.
2. Solar CellsThe application of ALD base materials in c-Si solar cells began with...Al2O3，Al2O3It is a highly effective surface passivation layer, found to significantly enhance the efficiency of c-Si solar cells and is applied in large-scale industrialization. Subsequent research has expanded the application of ALD from surface passivation layers to charge carrier transport materials.
3. CatalystALD technology easily controls the size, pore structure, content, and dispersion of nanoparticles, effectively designing core-shell structures, oxide/metal inverted structures, oxide confined structures, and structures with multi-metal tube sleeves and multi-layer structures. Its unique self-limiting property enables uniform and controllable deposition of catalytic materials onto high-surface-area materials.
Lithium-ion BatteryALD Application Features in Lithium-ion Batteries: (1) Electrode Material Preparation and Modification; (2) Protective Coating on Cathode Materials; (3) Artificial Solid Electrolyte Interphase (SEI) on Anode Materials; (4) Lithium Metal Anode Passivation and Prevention of Dendrite Growth; (5) Solid State Electrolyte (SSE) with ALD Functionality; (6) Protective Coating on Insulating Films
Application of ALD Technology by Yuan Su Technology in the lithium battery field mainly covers the following aspects:
a. Lithium-ion battery PP/PE separator coating, improves the wettability, pressure resistance, and thermal shrinkage properties of the separator.
b. Lithium-ion battery cathode coating, enhancing the battery's rate performance and cycling performance.
c. Lithium-ion battery anode coating to enhance battery's rate performance, cycling performance, and safety.
5. Optical CoatingALD films grow in a layer-by-layer mode with saturated adsorption, enabling the formation of high-uniformity films over complex geometrical surfaces, such as large curved surfaces and deep holes with high aspect ratios. These films are denser than PVD films, making them more suitable for manufacturing advanced precision optical devices for the future industrial sector.
6. BiologyALD can form a very dense protective film through low-temperature deposition, as the film thickness is at the nanoscale, it does not affect the equipment itself. After depositing an ALD coating, the lifespan and safety of the implanted devices can be significantly increased, and it may also effectively reduce the frequency of replacement. Moreover, ALD coatings have biocompatibility with various materials, and this coating is non-cytotoxic to human tissues. This makes ALD-deposited surface coatings suitable for preparing biocompatible substrates for cell construction in the field of regenerative materials, meeting the demand for new biocompatible materials. ALD coatings can effectively protect particles from the influence of surrounding air and moisture, thereby significantly extending the shelf life of products.
7.OLED: ALD encapsulation films with thicknesses as low as tens of nanometers can rival the barrier effects of traditional OLED encapsulation technologies, while offering excellent light transmittance, thermal conductivity, mechanical strength, corrosion resistance, and adhesion to substrates. Due to their nanoscale film thickness, ALD encapsulation films can achieve significant bending without altering the encapsulation performance, perfectly accommodating flexible OLED device encapsulation and enabling foldable and rollable displays. The superior conformability of ALD films enables excellent passivation coatings on complex shapes and three-dimensional nanoscale structures of LEDs, effectively blocking water and oxygen, enhancing performance. ALD-deposited passivation films on LED surfaces can also effectively repair destructive surfaces caused by plasma etching, significantly reducing leakage current and boosting LED efficiency.
