Equipment Specifications

Sample Quantity Handled: Gram Scale

Process Temperature: Temperature Range: RT~450°C

Pilot Lines: Up to 4 pilot lines supported ( customizable), including solid and liquid precursor source bottles

Heating System: Temperature Range: RT~150℃

Reagent Lines: Supports 2-way reagent gas lines ( customizable)

Carrier Gas: Standard:N₂MFC Flow Control (Customizable)

Pressure Monitoring: Three-film gauge assembly (corrosion-resistant), 0.005Torr - 1000Torr

Base Vacuum Degree: <5x10^-3 Torr

Vacuum System: Standard Oil Pump

Control System: 19-inch display, compatible with touch industrial-grade embedded industrial control computers, high reliability, expandable

Operating System: Windows 7, Industrial-grade Programmable Logic Controller, supports fieldbus and real-time multitasking operations

Process

Types of degradable film and their application scenarios include:

• High-K dielectric materialsAl₂O₃, H₂O, ZrO₂, PrA1Q, Ta₂O₅, La₂O₃);

• Metal interconnect structures (Cu, WN, TaN, Ru, In)

Catalytic Materials (Pt, Ir, Co,)TiO₂):

• Biological Coating (TiN, ZrN, TiAIN, AlTIN)

• Metals (Ru, Pd, Ir, Pt, Rh, Co, Cu, Fe, Ni)

• Piezoelectric layers (ZnO, AIN, ZnS)

• Transparent electrical conductors (ZnO:Al, ITO)

• Photonic Crystal (ZnO)TiO₂,Ta₃N₅);

Rack

• The frame is constructed with imported aluminum materials, featuring light weight, strong load-bearing capacity, and excellent heat dissipation.

• The shell is made of painted carbon steel with rounded corners, lightweight and aesthetically pleasing, easy to disassemble, and ergonomically designed.

• The screen rotates 360 degrees freely, adjustable viewing distance, angle, and free悬浮

Control System

• The control system is implemented using PLC + industrial computer + 19-inch touch screen, with communication via high-speed Ethernet.

• The equipment is controlled in real-time using a PLC, while also enabling interactive human-machine interface based on the Windows 7 operating system. It supports the storage and import/export functions for historical data, process recipes, alarms, and logs.

• The equipment supports the "One-Click Deposition" function, which automatically completes a series of steps including vacuum extraction, heating, material deposition, and cooling by simply clicking the run button. It enables the deposition of single or multi-layer materials; it provides an independent manual operation page, supporting manual valve operation, and the human-machine interaction supports mouse, keyboard, and touch input methods.

• The equipment's operating software provides user permission management, allowing usage permissions to be set according to user levels, preventing accidental operations, and ensuring equipment and personal safety.

The equipment's operation software offers logical interlock functionality to prevent user errors and pops up an information dialog box for prompts.

• Equipment operation software integrates safety and parameter configuration, IO interlock list information function

Vacuum System

· Vacuum measurement utilizes a combination of multiple vacuum gauges, providing more authentic, rapid, and precise process data. It offers genuine data collection sources for process personnel, ensuring reliable guarantees for the repeatability of the process.

Application Fields

Nano materialsALD technology offers highly controllable deposition parameters, enabling atomic-level precision in film formation and growth on complex three-dimensional micro-nano structure substrates of various sizes. It can produce nanometer-thin films with high uniformity, precision, and shape retention. ALD boasts high density and structural uniformity in aspect ratio, providing optimal solutions for MEMS mechanical wear-resistant layers, corrosion-resistant layers, dielectric layers, hydrophobic coatings, biocompatible coatings, and etching mask layers. The ALD deposition parameters are highly controllable, allowing precise control of the number of cycles to achieve the required parameters for MTJ, making it one of the best process solutions for MTJ manufacturing. ALD technology can improve the biocompatibility of nanopores through surface modification, while enhancing antibacterial and antiseptic properties and promoting cell synthesis.

2. Solar CellsThe application of ALD base materials in c-Si solar cells began with...Al₂O₃，Al₂O₃It is a highly effective surface passivation layer, found to significantly enhance the efficiency of c-Si solar cells and applicable in large-scale industrialization. Subsequent research has expanded the application of ALD from surface passivation layers to charge transport materials.

3. CatalystALD technology easily controls the size, pore structure, content, and dispersion of nanoparticles, effectively designing core-shell structures, oxide/metal inverted structures, oxide confined structures, and multi-metal tube structures with multi-layer structures. Its unique self-limiting property enables uniform and controllable deposition of catalytic materials on high surface area materials.

4. Lithium-ion batteriesALD Application Features in Lithium-ion Batteries: (1) Electrode Material Preparation and Modification; (2) Protective Coating on Cathode Materials; (3) Artificial Solid Electrolyte Interphase (SEI) on Anode Materials; (4) Lithium Metal Anode Passivation and Dendrite Growth Prevention; (5) Solid State Electrolyte (SSE) with ALD Function; (6) Protective Coating on Separator Films

Original Speed Technology's ALD application in the lithium battery field mainly includes the following aspects:

a. Lithium-ion battery PP/PE separator coating, improving the separator's wettability, pressure resistance, and thermal shrinkage properties.

b. Lithium-ion battery cathode coating, enhancing the battery's rate performance and cycling performance.

c. Lithium-ion battery negative electrode coating, enhancing the battery's rate performance, cycle life, and safety.

5. Optical CoatingALD films grow in a layer-by-layer mode with saturated adsorption, enabling the formation of high-uniformity films over complex geometrical surfaces such as large curved surfaces and deep holes with high aspect ratios. The films are denser than PVD films and are more suitable for manufacturing advanced precision optical devices in the future industrial sector.

6. BiologyALD can form a very dense protective film through low-temperature deposition, as the film thickness is at the nanoscale, it does not affect the equipment itself. Post-deposition of an ALD coating can significantly enhance the lifespan and safety of implanted devices, and may also effectively reduce the frequency of replacements. Additionally, ALD coatings exhibit biocompatibility with a variety of materials, making the coating non-cytotoxic to human tissues. This allows ALD-deposited surfaces to meet the demands for novel biocompatible materials in the field of regenerative medicine, when preparing substrates for cell construction with biocompatibility.

7.OLEDALD封装 films, just tens of nanometers thick, can even rival the barrier effects of traditional OLED encapsulation technology, while offering excellent transparency, thermal conductivity, mechanical strength, corrosion resistance, and adhesion to the substrate. Due to their nanometer-thin film thickness, ALD encapsulation films can achieve significant bending without altering the encapsulation effect, making them perfectly compatible with flexible OLED device encapsulation, enabling truly foldable and rollable displays. Their excellent form retention allows ALD films to act as exceptional passivation layers on the surfaces of LEDs with complex shapes and three-dimensional nanostructures, effectively blocking moisture and oxygen and enhancing performance. ALD deposition of passivation films on LED surfaces can also effectively repair destructive surfaces caused by plasma etching, significantly reducing leakage current and boosting LED efficiency.