Equipment Specifications
Substrate Size: Standard Size: 300mm Dia (12 inch) (Customizable)
Process Temperature: Temperature Range: RT~500°C, Accuracy: ±1°C ( customizable)
Pilot Line Configurations: Up to 6 pilot line gas paths supported ( customizable), including solid and liquid precursor source bottles
Heating System: Heating Temperature Range: RT~150℃
Reagent Pathways: Supports 2-way reagent gas pathways ( customizable)
Carrier Gas: Standard: N2MFC Flow Control (Customizable)
Pressure Monitoring: Dual Film Gauge Assembly (corrosion-resistant), 0.005Torr - 1000Torr
Base Vacuum Degree: <5x10-3 Torr
Vacuum System: Standard Oil Pump
Control System: 19-inch display, touch-enabled industrial-grade embedded industrial computer, high reliability, expandable
Operating System: Windows 7, Industrial-grade Programmable Logic Controller, supports fieldbus and real-time multi-tasking operations
Process
Types and application scenarios of degradable film include:
• High-K Dielectric MaterialAl2O3, H2O, ZrO2, PrA1Q, Ta2O5, La2O3);
• Metal interconnect structures (Cu, WN, TaN, Ru, In)
Catalytic Materials (Pt, Ir, Co,TiO2):
• Biological Coating (TiN, ZrN, TiAIN, AlTIN)
• Metals (Ru, Pd, Ir, Pt, Rh, Co, Cu, Fe, Ni)
• Piezoelectric layers (ZnO, AIN, ZnS)
• Transparent electrical conductors (ZnO:Al, ITO)
• Photonic Crystals (ZnO)TiO2, Ta3N5); etc.
Rack
• The frame is constructed with imported aluminum, featuring light weight, strong load-bearing capacity, and excellent heat dissipation.
• The shell is made of carbon steel with baked paint and rounded corners, lightweight and aesthetically pleasing, easy to disassemble, and ergonomically designed.
• The screen can rotate 360 degrees freely, with adjustable viewing distance, angle, and free悬浮 positioning.
Control System
• The control system is implemented using a PLC + industrial computer + 19-inch touch screen, with communication via high-speed Ethernet.
• The equipment is controlled in real-time by PLC, while also enabling interactive human-machine interface based on the Windows 7 operating system. It supports the storage and import/export functions for historical data, process recipes, alarms, and logs.
• The equipment supports the "One-Click Deposition" function, simply click the run button to automatically complete a series of steps including vacuum extraction, temperature rise, material deposition, and cooling. Achieves deposition of single or multi-layer materials; provides an independent manual operation page, supporting manual operation of valves, with human-machine interaction that supports mouse, keyboard, and touch input methods.
• The equipment's operating software provides user permission management functions, allowing usage permissions to be set according to user levels, preventing accidental operations, and ensuring equipment and personal safety.
• The equipment's operating software provides a logical interlock function to prevent user errors and pops up an information dialog box for prompts.
• Equipment operation software integrates safety and parameter configuration, as well as IO interlock list information function
Vacuum System
· Vacuum measurement employs a combination of dual vacuum gauges, ensuring more authentic, rapid, and precise process data. This provides well-verified data collection sources for process personnel, offering a reliable guarantee for the reproducibility of processes.
Application Fields
Nano materialsALD technology offers highly controllable deposition parameters, enabling atomic-level precision in film formation and growth on complex three-dimensional micro-nano structures of various sizes. It can produce nanoscale films with high uniformity, precision, and shape retention. ALD boasts high density and uniformity in longitudinal-width ratios, providing optimal solutions for MEMS mechanical wear-resistant layers, corrosion-resistant layers, dielectric layers, hydrophobic coatings, biocompatible coatings, and etching mask layers. The ALD deposition parameters are highly controllable, allowing precise control of the number of cycles to achieve the required parameters for MTJ. ALD technology can improve the biocompatibility of nanopores through surface modification, while enhancing antibacterial properties and promoting cell synthesis.
2. Solar CellsThe application of ALD base materials in c-Si solar cells beganAl2O3，Al2O3It is a highly effective surface passivation layer, found to significantly enhance the efficiency of c-Si solar cells and applicable in large-scale industrialization. Subsequent research has expanded ALD's application from surface passivation layers to charge carrier transport materials.
3. CatalystALD technology easily controls the size, pore structure, content, and dispersion of nanoparticles, effectively designing core-shell structures, oxide/metal inverted structures, oxide-confined structures, and multi-metal tube structures with multi-layer structures. Its unique self-limiting property enables uniform and controllable deposition of catalytic materials on high surface area materials.
4. Lithium-ion batteriesALD Application Features in Lithium-ion Batteries: (1) Electrode Material Preparation and Modification; (2) Protective Coating on Cathode Material; (3) Artificial Solid Electrolyte Interphase (SEI) on Anode Material; (4) Lithium Metal Anode Passivation and Dendrite Growth Prevention; (5) Solid Electrolyte (SSE) with ALD Function; (6) Protective Coating on Separator Film
Original Speed Technology's ALD application in the lithium battery field mainly covers the following aspects:
a. Lithium-ion battery PP/PE separator coating, enhancing separator wettability, pressure resistance, and thermal shrinkage properties.
b. Lithium-ion battery cathode coating, enhancing battery's rate performance and cycling performance.
c. Lithium-ion battery anode coating to enhance battery's rate performance, cycling performance, and safety.
5. Optical CoatingALD films grow in a layer-by-layer mode with saturated adsorption, allowing for the formation of high-uniformity films over complex geometric surfaces, such as large curved surfaces and deep holes with high aspect ratios. These films are denser than PVD films and are more suitable for manufacturing advanced precision optical devices in the future industrial sector.
6. BiologyALD can form a very dense protective film through low-temperature deposition, and due to its nanoscale film thickness, it does not affect the equipment itself. Post-deposition of the ALD coating can significantly increase the lifespan and safety of implanted devices, and may also effectively reduce the frequency of replacements. Additionally, ALD has biocompatibility with a variety of materials, making this coating non-cytotoxic to human tissue. This allows ALD-deposited surfaces to meet the demand for novel biocompatible materials in the field of regenerative medicine, when preparing substrates for constructing biocompatible matrices for cell building.
7.OLEDALD encapsulation films with thicknesses as low as tens of nanometers can rival the barrier effects of traditional OLED encapsulation technologies, while offering excellent transparency, thermal conductivity, mechanical strength, corrosion resistance, and adhesion to substrates. Due to their nanoscale thickness, ALD encapsulation films can achieve significant bending without compromising encapsulation integrity, making them perfectly compatible with flexible OLED device encapsulation, enabling foldable and rollable displays. Their superior conformability allows for excellent passivation layers on complex shapes and 3D nanoscale structures of LEDs, effectively blocking moisture and oxygen, enhancing performance. ALD-deposited passivation films on LED surfaces can also effectively repair destructive surfaces caused by plasma etching, significantly reducing leakage current and boosting LED efficiency.
