Equipment Specifications
Substrate Size: Standard Size: 200mm Dia (8 inch) (Customizable)
Process Temperature: Temperature Range: RT~500°C (Customizable)
Pilot Circuit Configurations: Supports up to 6 pilot circuit paths ( customizable), including both solid and liquid precursor source bottles
Heating System: Heating Temperature Range: RT~150℃
Reagent Pathways: Supports 2-way reagent gas pathways ( customizable)
Gas Carrier: Standard: N2 MFC Flow Control (Customizable)
Plasma System: Supports 4 plasma gas lines ( customizable )
RF Power: 0~1000W
Pressure Monitoring: Double-membrane gauge assembly (corrosion-resistant), 0.005Torr - 1000Torr
Base Vacuum Degree: <5x10-3 Torr
Vacuum System: Standard Oil Pump
Control System: 19-inch monitor, compatible with touch-enabled industrial-grade embedded industrial computer, high reliability, expandable
Operating System: Windows 7 OS, Industrial-grade programmable logic controller, supports fieldbus and real-time multi-tasking operations
High-Temperature Heating Module: Independent source bottle heating module, supporting RT~200℃
Gloved Box System: Equipment integrated gloved box, standard supports double gloves, single station ( customizable)
Process
Types and application scenarios of degradable film include:
• High-K dielectric materials (AO, H1O, ZrO)
• Metal interconnect structures (Cu, WN, TaN, Ru, In)
Catalytic Materials (Pt, Ir, Co, TiO):
• Biological Coatings (TiN, ZIN, TiAIN, AITIN)
• Metals (Ru, Pd, Ir, Pt, Rh, Co, Cu, Fe, Ni)
• Piezoelectric layers (ZnO, AIN, ZnS)
• Transparent electrical conductors (ZnOAl, ITO)
• Photonic crystals (ZnO, ZnSIMn, TiO, TaN); etc.
Rack
•The frame is constructed with imported aluminum materials, featuring light weight, strong load-bearing capacity, and excellent heat dissipation properties.
• The housing is made of carbon steel with baked paint and rounded corners, lightweight and aesthetically pleasing, easy to disassemble, and ergonomically designed.
• The screen can rotate 360 degrees freely, allowing adjustable viewing distance, angle, and free floating.
Control System
• The control system is implemented with a PLC, industrial computer, and a 19-inch touch screen, communicating via high-speed Ethernet.
• The equipment is controlled in real-time using a PLC, while also featuring an interactive human-machine interface based on the Windows 7 operating system, supporting the storage and import/export functions for historical data, process formulas, alarms, and logs.
• The equipment supports the "One-Click Deposition" function, where simply clicking the run button automatically completes a series of steps including vacuum extraction, heating, material deposition, and cooling. It facilitates the deposition of single or multi-layer materials; it also provides an independent manual operation page, supporting manual on/off valve operations. The human-machine interaction supports mouse, keyboard, and touch input methods.
• The equipment's operating software offers user permission management, allowing usage permissions to be set according to user levels, preventing accidental operation, and ensuring equipment and personal safety.
• The equipment's operating software provides a logical interlock function to prevent user errors and pops up an information dialog box for prompts.
• Equipment operation software integrates safety features, parameter configuration, and IO interlock list information function
Vacuum System
· Vacuum measurements utilize a combination of dual vacuum gauges, ensuring more authentic, swift, and precise process data. This provides well-validated data collection sources for process personnel and offers reliable assurance for the repeatability of the process.
Application Areas
Nano materialsALD technology offers highly controllable deposition parameters, enabling atomic-level precision in film formation and growth on complex three-dimensional micro-nano structure substrates of various sizes. It can produce nanometer-thin films with high uniformity, accuracy, and shape retention. ALD boasts high density and uniformity in longitudinal and transverse structures, providing optimal solutions for MEMS mechanical wear-resistant layers, corrosion-resistant layers, dielectric layers, hydrophobic coatings, biocompatible coatings, and etching mask layers. The controllable deposition parameters of ALD technology can precisely control the number of cycles to achieve the various parameters required for MTJ, making it one of the best process solutions for MTJ manufacturing. ALD technology can improve the biocompatibility of nanopores through surface modification, while enhancing antibacterial properties and promoting cell synthesis.
2. Solar CellsALD base materials find application in c-Si solar cells with the beginning of Al2O3，Al2O3It is a highly effective surface passivation layer that has been found to significantly enhance the efficiency of c-Si solar cells and is applicable in large-scale industrialization. Subsequent research has expanded the application of ALD from surface passivation layers to carrier transport materials.
3. CatalystALD technology easily controls the size, pore structure, content, and dispersion of nanoparticles, effectively designing core-shell structures, oxide/metal inverted structures, oxide confinement structures, and structures with multi-metal tube structures and multilayer structures. Its unique self-limiting characteristic enables uniform and controllable deposition of catalytic materials on high surface area materials.
4. Lithium-ion batteriesALD Application Characteristics in Lithium-ion Batteries: (1) Preparation and Modification of Electrode Materials; (2) Protective Coating on Cathode Materials; (3) Artificial Solid Electrolyte Interphase (SEI) on Anode Materials; (4) Dulling of Lithium Metal Anodes and Prevention of Dendrite Growth; (5) Solid State Electrolyte (SSE) with ALD; (6) Protective Coating on Separation Membranes
Original Speed Technology's ALD application in the lithium battery field mainly includes the following aspects:
a. Lithium-ion battery PP/PE separator coating, improves the separator's wettability, pressure resistance, and thermal shrinkage properties.
b. Lithium-ion battery cathode coating, enhancing battery's rate performance and cycling performance.
c. Lithium-ion battery anode coating to enhance battery's rate performance, cycling performance, and safety.
5. Optical CoatingALD films grow in a layer-by-layer mode with saturated adsorption, allowing for the formation of highly uniform films over complex geometrical surfaces such as large curved surfaces and deep holes with high aspect ratios. Compared to PVD films, the ALD films are denser and more suitable for manufacturing advanced precision optical devices in the future industrial sector.
6. BiologyALD can form a very dense protective film through low-temperature deposition. Due to its nano-scale film thickness, it does not affect the equipment itself. After depositing an ALD coating, the lifespan and safety of the implanted devices can be significantly increased, and it may also effectively reduce the frequency of replacements. Additionally, ALD has biocompatibility with various materials, and this coating is non-cytotoxic to human tissues. This makes ALD deposited surface coatings suitable for preparing biocompatible substrates for cell construction in this field, fulfilling the demand for new biocompatible materials.
7.OLEDALD封装 films with thicknesses of just tens of nanometers can rival the barrier effects of traditional OLED encapsulation technology, while also offering excellent transparency, thermal conductivity, mechanical strength, corrosion resistance, and adhesion to substrates. Due to their nanometer-scale thickness, ALD encapsulation films can achieve significant bending without compromising the encapsulation, making them perfectly compatible with flexible OLED device encapsulation, enabling truly foldable and rollable displays. The excellent form-fitting properties of ALD films allow for exceptional passivation layers on complex shapes and 3D nanoscale LED surfaces, effectively blocking water and oxygen and enhancing performance. ALD-deposited passivation films on LED surfaces can also effectively repair destructive surfaces caused by plasma etching, significantly reducing leakage current and improving LED efficiency.
