Optical profiler/white light interferometer/Zeta-300 Optical Profiler
Zeta-300 supports 3D measurement and imaging capabilities, and offers integrated isolation workbenches and flexible configurations for processing larger samples. This system uses ZDot ™ Technology that can simultaneously capture high-resolution 3D data and True Color infinite focus images. Zeta-300 features a Multi Mode optical system, easy-to-use software, and low cost of ownership, making it suitable for research and production environments.
Product description
The Zeta-300 optical profilometer is a non-contact 3D surface topography measurement system. Zeta-300 inherits the functionality of Zeta-20 and adds isolation options and flexibility in handling larger samples. This system uses ZDot ™ Technology and Multi Mode optical systems can measure various types of samples: transparent and opaque, low to high reflectivity, smooth to rough textures, and step heights ranging from nanometers to millimeters.
The configuration of Zeta-300 is flexible and easy to use, and it integrates six different optical measurement technologies. ZDot ™ The measurement mode can simultaneously collect high-resolution 3D scans and True Color infinite focal length images. Other 3D measurement techniques include white light interferometry, Nomarski interferometric contrast microscopy, and shear interferometry. ZDot or integrated broadband reflectometer can measure the thickness of thin films. Zeta-300 is also a high-end microscope that can be used for sample retesting or automatic defect detection. Zeta-300 is suitable for research and production environments by providing excellent measurement of step height, roughness, and film thickness, as well as defect detection capabilities.
Main functions
·A simple and easy-to-use optical profiler using ZDot and Multi Mode optical components, with a wide range of applications
·High quality microscope suitable for sample retesting or defect detection
·ZDot: Simultaneously collect high-resolution 3D data and True Color infinite focus images
·ZXI: White light interferometry measurement technology, suitable for wide area measurement with high z-resolution
·ZIC: Interference Contrast, suitable for surfaces with sub nanometer roughness and providing their 3D quantitative data
·ZSI: Shear interferometry technology provides high-resolution images in the z-direction
·ZFT: Measuring film thickness and reflectivity using an integrated broadband reflectometer
·AOI: Automatic optical inspection and quantification of defects on samples
·Production capacity: Fully automated measurement achieved through sequencing and pattern recognition
Main applications
·Step height: 3D step height ranging from nanometers to millimeters
·Texture: Smooth to very rough surface roughness and waviness
·Appearance: 3D warping and shape
·Stress: 2D thin film stress
·Film thickness: 30nm to 100 μ m transparent film thickness
·Defect detection: Capture defects larger than 1 μ m
·Defect re inspection: Using KLARF files as navigation to measure the 3D surface morphology of defects or the location of cutting defects
industrial applications
·LED: Light Emitting Diode and PSS (patterned sapphire substrate)
·Semiconductors and compound semiconductors
·Semiconductor WLCSP (wafer level chip level packaging)
·Semiconductor FOWLP (Fan Out Wafer Level Packaging)
·PCB and flexible PCB
·MEMS (Micro Electro Mechanical Systems)
·Microfluidic equipment
·Data storage
·Universities, research laboratories, and institutes
·More: Please contact us to meet your requirements