HMDS Vacuum Coating Machine, Dust-Free HMDS Oven, Automatic Adhesive Vapor Deposition System Overview

The HMDS pretreatment system, by controlling parameters such as working temperature, processing time, and holding time during the oven pretreatment process, can evenly coat a layer of HMDS on the surface of silicon wafers and substrates. This reduces the contact angle of the silicon wafers after HMDS treatment, decreases the amount of photoresist used, and enhances the adhesion between the photoresist and the silicon wafer. It is suitable for the pretreatment of materials such as silicon wafers, Ga*, ceramics, stainless steel, niobium lithium, glass, sapphire, and wafers, as well as related industries.

HMDS vacuum coating machine, dust-free HMDS oven features

Improved pretreatment performance:

Uniform processing:

High efficiency:

More cost-effective:

More environmentally friendly and sustainable:

Automated HMDS Absorption

Auto-adding HMDS

HMDS Gas Pipeline Heating System

Parameter Record Feature:

Temperature and Program Interlock Function

HMDS Vacuum Coating Machine, Dust-Free HMDS Oven, and the Necessity of an Automatic Adhesive Vapor Deposition System

HMDS sputtering involves using inert gases (such as nitrogen) to carry HMDS vapor over the chip surface, forming a thin film. Its purpose is: A. To remove trace moisture from the chip surface. B. To prevent moisture in the air from re-adhering to the crystal surface. C. To enhance the adhesion of photoresist (especially positive photoresist) to the crystal surface, thereby reducing lifting-off during subsequent development processes or "undercutting" during etching. Currently, regulations stipulate that photoresist must be applied within 4 hours after HMDS sputtering to ensure its functionality.

Applying HMDS to the surfaces of silicon wafers, GaAs, niobium lithium, glass, sapphire, and wafers in semiconductor manufacturing, followed by heating in an oven, can react to form compounds primarily composed of silicon oxides. It successfully transforms the wafer surface from hydrophilic to hydrophobic, with its hydrophobic groups bonding well with photoresist, serving as a coupling agent.

HMDS Vacuum Coating Machine, Dust-Free HMDS Oven, Automatic Adhesive Vapor Deposition System Technical Specifications

Material: Outer case made of stainless steel or high-quality cold-rolled steel with electrostatic powder coating, inner case made of 316L grade stainless steel

Temperature Range: RT+10-250℃

Temperature Resolution: 0.1℃

Temperature Fluctuation: ≤±0.5

Vacuum Degree: ≤133 Pa (1 Torr)

Cleanliness: Class 100; equipment made of dust-free materials, suitable for 100-class cleanroom lithography environment

Vacuum Pump: Scroll-type oil pump or imported oil-free pump