HMDS Coating Ovens, MES System HMDS Coating Machine, Intelligent HMDS OvenIntroduction:

The primary function of the HMDS coating oven is to perform surface treatment on wafers to enhance the adhesion of photoresist on the wafer surface. When wafers are delivered to the yellow light area, there may be moisture layers on the surface. After high-temperature baking, the moisture is removed, and the wafer surface is converted from polar to non-polar through the HMDS process. This adjusts the surface energy of the wafer to a level comparable to the photoresist surface, allowing the photoresist to adhere well to the wafer surface.

First, heat to 100°C-200°C to remove moisture on the silicon wafer surface, then HMDS reacts with the surface OH groups, forming siloxanes on the silicon wafer surface, breaking hydrogen bonds, thereby transforming the polar surface into a non-polar surface. The reaction continues until steric hindrance (larger trimethyl groups) prevents further reaction.

HMDS Coating Oven, MES System HMDS Coating Machine, Intelligent HMDS OvenFeatures:

HMDS is vapor deposited onto the surface of silicon wafers, which means the wafers are placed in a high-temperature environment with HMDS vapor.

2. No need to remove the HMDS layer from the silicon wafer surface during the development process.

3. When spin-coating photoresist on HMDS, the solvent in the photoresist will not damage the HMDS layer.

Excess HMDS vapor (exhaust) will be extracted by a vacuum pump and discharged into a dedicated waste gas collection pipeline.

5. All processes are completed within a sealed cavity, so there is no risk of exposure to HMDS vapor during operation.

6. Multiple product processes can be saved, with one-click completion of process techniques, no need for on-site staff.

HMDS Coating Ovens, MES System HMDS Coating Machine, Technical Specifications of Intelligent HMDS Drying Oven:

Model Number: JS-HMDS90
2. Studio Sizes (mm): 450x450x450, 650*650*650, 800*800*800, 1200*1000*1200; Customizable Sizes Available
3. Dimensions: Varying with the internal cavity size
Material: Outer case is made of high-quality cold-rolled steel with powder coating or stainless steel, inner case is made of 316L-grade stainless steel.
5. Temperature Range: RT+10-250℃
6. Temperature Resolution: 0.1℃
7. Temperature Fluctuation: ≤±0.5
8. Vacuum Degree: ≤133pa (1 torr)
9. Cleanliness: Class 100, equipment made of dust-free materials, suitable for 100-class photolithography cleanroom environment
10. Power Supply and Total Power: AC 220V±10% / 50Hz, Total Power Approximately 3.0KW
11. Weight: Approx. 180 kg
12. Control Instruments: Human-Machine Interface
13. Shelves: 2-tier
14. HMDS Control: Capable of Controlling HMDS Night Addition Quantity
15. Vacuum Pumps: Scroll Oil Pump or Dry Pump
16. Protection Devices - HMDS Leak Alarm Device, Automatic HMDS Addition, Overheat Protection, Leakage Protection, Overheat Protection, etc.