Deposition System, Vapour Phase Deposition Equipment, Vacuum Coating MachineTrends in development
The deposition system is a film deposition equipment used with (SiH₄) as a precursor, primarily for material preparation in fields such as semiconductor, nanoimprint lithography, photovoltaics (solar cells), display panels, glass, ceramics, and nanomaterials. (SiH₄) is a key chemical for depositing amorphous silicon (a-Si), microcrystalline silicon (μc-Si), silicon nitride (SiNₓ), and silicon dioxide (SiO₂) films due to its high reactivity and low-temperature deposition characteristics.
High Purity: Reduces metal impurities and enhances the electrical properties of the film.
- **Mixed Precursor**: Combines with organosilicon compounds (such as TEOS) to optimize film properties.
- **Intelligent Control**: AI real-time adjustment of process parameters, enhancing yield.
- Green Technology: Develop alternatives (such as SiH₂Cl₂) or efficient exhaust gas recovery technology.
Semiconductor Manufacturing: Deposit dielectric layers (such as SiO₂, SiNₓ), passivation layers, or isolation layers.
- **Photovoltaic Industry**: Absorbing layer or passivation layer for the preparation of amorphous silicon/microcrystalline silicon thin-film solar cells.
- **Display Technology**: Used for the insulating layer or passivation film of thin-film transistors (TFT) in TFT-LCD or OLED displays.
**MEMS Devices**: Structural or protective layers for constructing microelectromechanical systems.
Deposition System, Vapour Phase Deposition Equipment, Process Parameter Optimization for Vacuum Coating Machines
- **Temperature**: 80-200
- **Pressure**: 100pa; Low-pressure environment improves film uniformity and deposition rate.
Operation Method: Human-Machine Interface, One-Click Operation
Oil-Free Scroll Vacuum Pump
Process Editor: Stores up to 5 menus
All-Gas Line: N2, Automatic Control
Chemicals: 1-5 Grades
Volume: 20L-210L, customizable
Product Compatibility: 2" to 12" wafers and fragments, squares, etc.
Applicable Industries: MEMS, filters, amplifiers, power devices, wafers, glass, precious metals, and third-generation semiconductor materials such as SiC (Silicon Carbide), GaN (Gallium Nitride), ZnO (Zinc Oxide), GaO (Gallium Oxide), and diamond.
Shanghai Junsi Instrument, a semiconductor equipment manufacturer, offers vapor deposition equipment including adhesive additives (such as HMDS), anti-stick deposition, release agent (PFTS) deposition, surface modification and treatment, nanoimprint release, precision thermal plates, HMDS pretreatment system ovens, intelligent HMDS vacuum pretreatment system ovens, MSD ultra-low humidity ovens, dust-free ovens, clean ovens, nitrogen ovens, oxygen-free ovens, dust-free oxygen-free ovens, vacuum ovens, vacuum storage cabinets, ultra-low temperature test chambers, and ultra-low humidity test chambers, among other environmental reliability equipment.
