Pulse Laser Deposition System Pioneer 120 Advanced

Product Description
Neocera PioNeer Series PLD Systems — Innovative design based on experience, extensive research conducted on PLD, establishing critical parameters for achieving optimal film quality, especially suitable for depositing complex oxide films.
These thoughts have been applied to Pioneer system is designed.
• Many complex oxide thin films can achieve higher quality when cooled under relatively high oxygen pressures (>100 Torr). All PioThe Neer system is equipped with this feature (pressure range from rated initial pressure to atmospheric pressure). This also benefits the generation of nanoparticles.
• PioThe Neer PLD system features a laser beam incidence angle of 45°, maintaining the maximum uniformity of laser density on the target material while avoiding the use of complex and expensive optical components. A larger incidence angle can elongate the laser spots on the target material, leading to a loss in density uniformity.
• To avoid the use of expensive oxygen-compatible vacuum pumps and eliminate the impact of oil backflow on film quality, all PioNeer systems are equipped with standard oil-free pump systems.
• Our research indicates that the distance between the target and the substrate is a key parameter for achieving the best film quality. PioThe Neer system can control the distance between the target material and the substrate to achieve optimal deposition conditions.

Technical Specifications
Base size: 10mm x 10mm to 2 inches diameter
2. Sediment chamber: 12 inches in diameter
3. Substrate Temperature: Up to 850°C, radiant heater, oxygen compatible
4. Multi-target conveyor belt: 6 x 1 inch or 3 x 2 inch
5. Quality Flow Controllers (s): One MFC oxygen is standard; additional MFCs are optional.
6. Software Control: Windows 7, Labview 2013
7. Upgrades: RHEED, RF-DC Sputtering/DC Ion Source, LAXS, IES, Laser Heater

Application Fields
Pulsed Laser Deposition (PLD) is a versatile thin-film deposition technique. It rapidly evaporates the target material using a pulsed laser, creating a film with the same composition as the target. The uniqueness of PLD lies in the fact that the energy source (pulsed laser) is located outside the vacuum chamber. This allows for a wide dynamic range of working pressure during material synthesis, reaching from 10-10 Torr to 100 Torr. By controlling the deposition pressure and temperature, a range of nanoscale structures and nanoparticles with unique functionalities can be synthesized. Additionally, PLD is a "digital" technology that enables process control at the nanoscale.Å/pulse）。
• Neocera has extensive experience in PLD equipment and process development.
• PioThe Neer series PLD system is the most widely used commercial system in the global research and development field.
• Neocera not only provides clients with the most basic PLD systems, but also offers complete PLD laboratory turnkey solutions