High-Vacuum Atomic Layer Deposition System UHV

Equipment Specifications

Substrate Size: Standard Size: 100mm Dia (4 inch) (Customizable)

Process Temperature: Temperature Range: RT~400°C, Accuracy: ±1°C (Customizable)

Pilot Line Configurations: Up to 6 pilot lines supported ( customizable), including solid and liquid precursor source bottles

Heating System: Heating Temperature Range: RT~150℃

Reagent Lines: Supports 2-way reagent gas lines ( customizable)

Gas Carrier: Standard:N₂MFC Flow Control (Customizable)

High vacuum system: High-performance molecular pumps, capable of meeting high vacuum level requirements

Control System: 19-inch monitor, touch-enabled industrial-grade embedded industrial computer, high reliability, expandable

Operating System: Windows 7 OS, Industrial-grade Programmable Logic Controller, supports Fieldbus and Real-time Multitasking Operations

Film Transfer System: Manual magnetic rod film transfer, equipped with dedicated film transfer cavity, gate valve, and vacuum system ( customizable)

Process

Types and application scenarios of degradable film include:

• High-K Dielectric MaterialH₂O, ZrO₂, PrAlQ, Ta₂O₅, La₂O₃ );

• Metal interconnect structures (Cu, WN, TaN, Ru, In)

Catalytic Materials (Pt, Ir, Co,)TiO₂):

• Biological Coating (TiN, ZrN, TiAIN, AlTIN)

• Metal (Ru, Pd, Ir, Pt, Rh, Co, Cu, Fe, Ni)

• Piezoelectric Layers (ZnO, AIN, ZnS)

• Transparent electrical conductors (ZnO:Al, ITO)

Photonic Crystal (ZnO)TiO₂, Ta₃N₅); etc.

Rack

•The frame is constructed with imported aluminum, featuring light weight, high load-bearing capacity, and excellent heat dissipation properties.

• The housing is made of carbon steel with baked paint and rounded corners, lightweight and aesthetically pleasing, easy to disassemble, and ergonomically designed.

• The display screen rotates 360 degrees freely, adjustable viewing distance and angle, and free floating

Control System

• The control system is implemented using PLC + industrial computer + 19-inch touch screen, with communication via high-speed Ethernet.

• The equipment is controlled in real-time using PLCs, while also providing interactive human-machine interface based on the Windows 7 operating system. It supports storage and import/export functions for historical data, process recipes, alarms, and logs.

• The equipment supports the "One-Click Deposition" function, where a single click on the run button automatically completes a series of steps including vacuum extraction, heating, material deposition, and cooling. It enables the deposition of single or multi-layer materials; it provides an independent manual operation page, supporting manual valve operation, and the human-machine interaction supports mouse, keyboard, and touch input methods.

The equipment's operating software offers user permission management features, allowing usage permissions to be set according to user levels, preventing incorrect operations, and ensuring the safety of both the equipment and personnel.

• The equipment's operating software provides logical interlock functionality to prevent user errors and pops up an information dialog box for prompts.

• The equipment's operational software integrates security features, parameter configuration, and an IO interlock list information function.

Application Fields

Nano materialsALD technology offers highly controllable deposition parameters, enabling atomic-level precision film formation and growth on complex three-dimensional micro-nano structure substrates of various sizes. It can produce nanometer-scale films with high uniformity, precision, and shape retention. ALD provides optimal solutions for high-density and high aspect ratio structural uniformity, catering to the needs of MEMS mechanical wear-resistant layers, corrosion-resistant layers, dielectric layers, hydrophobic coatings, biocompatible coatings, and etching mask layers. The ALD technology's controllable deposition parameters can precisely control the number of cycles to achieve the required parameters for MTJ, making it one of the best process solutions for MTJ manufacturing. ALD technology can improve the biocompatibility of nanometer-sized pores through surface modification, while enhancing antibacterial and antiseptic properties and promoting cell synthesis.

2. Solar CellsThe application of ALD base materials in c-Si solar cells began with...Al₂O₃，Al₂O₃It is a highly effective surface passivation layer that has been found to significantly enhance the efficiency of c-Si solar cells and is applicable in large-scale industrialization. Subsequent research has expanded the application of ALD from surface passivation layers to carrier transport materials.

3. CatalystALD technology easily controls the size, pore structure, content, and dispersion of nanoparticles, effectively designing core-shell structures, oxide/metal inverted structures, oxide-confined structures, and structures with multi-metal tube structures and multilayer structures. Its unique self-limiting characteristic enables uniform and controllable deposition of catalytic materials on high surface area materials.

4. Lithium-ion BatteriesALD Application Features in Lithium-ion Batteries: (1) Electrode Material Preparation and Modification; (2) Protective Coating on Cathode Materials; (3) Artificial Solid Electrolyte Interphase (SEI) on Anode Materials; (4) Lithium Metal Anode Passivation and Prevention of Dendrite Growth; (5) Solid-State Electrolyte (SSE) with ALD Function; (6) Protective Coating on Insulating Films

Original Speed Technology's ALD applications in the lithium-ion battery field mainly encompass the following aspects:

a. Lithium-ion battery PP/PE separator coating, improving the separator's wettability, pressure resistance, and thermal shrinkage properties.

b. Lithium-ion battery cathode coating, improving battery rate performance, cycling performance, etc.

c. Lithium-ion battery negative electrode coating to enhance battery rate performance, cycling performance, and safety.

5. Optical CoatingALD films, grown via a layer-by-layer saturation adsorption mode, can form high-uniformity films over complex geometrical surfaces such as large curved surfaces and deep holes with high aspect ratios. These films are denser than PVD films and are more suitable for manufacturing advanced precision optical devices for the future industrial sector.

6. BiologyALD can form a highly dense protective film through low-temperature deposition, and due to its nanoscale film thickness, it does not affect the equipment itself. The deposition of ALD coatings can significantly extend the lifespan and safety of implanted devices, and may also effectively reduce the frequency of replacement. Additionally, ALD has biocompatibility with various materials, and this coating is non-cytotoxic to human tissue. This makes ALD deposited surfaces suitable for preparing biocompatible substrates for cell construction in the field of regenerative medicine, fulfilling the demand for new biocompatible materials.

7.OLED: ALD encapsulation films with thicknesses as thin as tens of nanometers can even match the barrier effect of traditional OLED encapsulation technology, while offering excellent transparency, thermal conductivity, mechanical strength, corrosion resistance, and adhesion to substrates. Due to their nanoscale film thickness, ALD encapsulation films can achieve significant bending without compromising the encapsulation effect, perfectly compatible with flexible OLED device encapsulation, enabling truly foldable and rollable displays. The exceptional form-fitting properties of ALD films enable excellent passivation layers on complex shapes and 3D nanoscale structures of LEDs, effectively blocking moisture and oxygen, enhancing performance. ALD deposition of passivation films on LED surfaces can also effectively repair destructive surfaces caused by plasma etching, significantly reducing leakage current and improving LED efficiency.