Pulse Laser Deposition System Pioneer 180

Product Description
Neocera PioNeer Series PLD Systems — Innovative Design Based on Zhuo Yue's Experience Neocera has conducted in-depth and extensive research using PLD, establishing critical parameters for achieving optimal film quality, particularly suitable for depositing complex oxide films. These insights have been applied to the Pioneer system design.
• Many complex oxide films can achieve higher quality when cooled under relatively high oxygen pressure (>100 Torr). All PioThe Neer system features this capability (pressure range from rated initial pressure to atmospheric pressure). This also benefits the generation of nanoparticles.
• PioThe Neer PLD system features a laser beam incidence angle of 45°, maintaining the maximum uniformity of laser density on the target material while avoiding the use of complex and expensive optical components. A larger incidence angle can elongate the laser spots on the target material, resulting in a loss of density uniformity.
• To avoid using expensive oxygen-compatible vacuum pumps and eliminate the impact of oil backflow on film quality, all PioThe standard configuration of the Neer system employs oil-free pump systems.
• Our research indicates that the distance between the target and substrate is a critical parameter for achieving the best film quality.The Neer system can control the distance between the target material and the substrate to achieve optimal deposition conditions.

Application Fields
Pulsed Laser Deposition (PLD) is a versatile thin-film deposition technique. It rapidly evaporates the target material using a pulsed laser to form a film with the same composition as the target. The uniqueness of PLD lies in the energy source (pulsed laser) being located outside the vacuum chamber. This allows for a wide dynamic range of working pressures during material synthesis, reaching from 10-10 Torr to 100 Torr. By controlling the deposition pressure and temperature, a range of nanostructures and nanoparticles with unique functionalities can be synthesized. Additionally, PLD is a "digital" technique for process control at the nanoscale (Å/pulse).
• Neocera boasts unparalleled experience in PLD equipment and process development.
• PioThe Neer series PLD system is the most widely used commercial system in this research and development field.
• Neocera not only provides customers with the most basic PLD systems but also offers complete PLD laboratory turnkey solutions