The ADP/ADS series 2 offers four models to meet various vacuum requirements. For clean environment process applications, choose the LM type; for light or medium-duty applications, opt for the P type; and the H type is suitable for stringent process environments. Many leading manufacturers from the semiconductor industry have chosen this product, which has significantly reduced their unplanned downtime, thereby saving operational costs and increasing profitability.

Features:

High reliability in processing capability

·Wide cross slots can accommodate a large amount of dust and particles

·An accurate and sealed temperature control system, high operating temperatures, and a linear increase in gas temperatures from import to export

·Vertical suction is adopted at all levels to prevent dust accumulation in the blow-off cavity.

Primarily applied in semiconductor manufacturing

·Compact: The ADP/ADS series 2 is only about 390 mm wide

·Clean: Alcat vacuum pumps are frictionless and oil-free, thus eliminating the risk of dust contamination.

·Quiet: All models of Alcat vacuum pumps are equipped with a noise reduction unit, external silencing devices are not required.

· Compatible with Semiconductor S2

Affordable and high-quality

· Operating pressure and low energy consumption under maximum pressure

·ADP/ADS Series 2 operates at low temperature and consumes very little water.

·Users can easily set the nitrogen purification level, applicable for clean environments that do not require purification.

Typical Application Processes:

·ADP 122 LM, ADS 602 LM 

Vacuum Loading Room, Conveying Room, Physical Vapor Deposition, Coating

·ADP 122 P, ADS 602 P, ADS 1202 P, ADS 1802 P

Graying, glass unpacking, dielectric, wire etching, injection source, medium chemical vapor deposition

·ADS 602 H, ADS 1202 H, ADS 1802 H

Plasma-enhanced chemical vapor deposition, low-pressure chemical vapor deposition