Mask preparation technology mainly utilizes exposure and etching processes (similar to photolithography for creating high-precision patterns on silicon surfaces). This method allows for flexible design of various patterns according to customer requirements, with standardized dimensions of the patterns produced. Our pattern size accuracy exceeds 0.01mm, featuring sharp edges without burrs, good straightness of openings, and excellent circularity.

Circular Mask Blank Product Features:
1. Low mold-making cost, allows for any changes to the mask pattern according to the designer's specifications, cost-effective
2. Achieve semi-embossing on metal, add company logo, and achieve branding.
3. Precision, up to +/-0.0075mm accuracy to meet the assembly requirements of various products.
4. Complexly shaped products can also be etched without incurring additional costs.
5. Free from burrs, indentations, no deformation of the product, no alteration to material properties, and no impact on product functionality.
6. Both thick and thin materials can be processed uniformly, meeting the requirements of various assembly components.
7. Virtually all metals can be etched, with no restrictions on various pattern designs.
8. Manufacture metal components that cannot be produced through conventional machining processes.

If the customer has samples of their own circular mask blank, we can simply consider producing a single mask blank as shown. If there is no satisfactory solution for fixing the device, we recommend using our lamination design method.