This equipment utilizes magnetron sputtering, offering dense, fine, high-hardness, glossy, and flexible coatings. The use of HiPIMS power sources significantly enhances coating speed. The bias voltage effectively improves the adhesion between the coating and the substrate, boosts coating rate, and enhances coating quality. It is an ideal device for depositing metal coatings, compound coatings, and various composite coatings. The molecular pump system effectively prevents and resolves the oil backflow issue caused by long-term operation, further improving coating quality and saving electrical energy. The planar magnetron target features a target door for easy material replacement and cleaning, and is equipped with an automatic shutter to prevent cross-contamination and pre-coating cleaning. The entire machine is easy to operate and reliable, capable of fully automated production, and can store and modify multiple process production procedures.