Information in English:

LH1000 Dual-frequency Interferometer.pdf

Nonlinear error analysis and experimental measurement of.pdf

High-precision measurement system specifically developed for lithography machine applications.

Passed the acceptance of the national major special project "Technology and Integrated Process for Large-scale Integrated Circuit Manufacturing."

Utilizing a dual-frequency laser with direct output linearly polarized light.

Nonlinear high-precision measurement system, for more accurate measurements.

Offer products with any frequency difference within the range of 1~20MHz, catering to various measurement speed requirements.

The light source and measurement signal receiving unit feature a modular design, facilitating the assembly of multi-axis measurement systems such as XY displacement tables.

Handy, compact measurement signal fiber optic receiver head, easy to install even in limited spaces.

Standard lithography interferometer installation dimensions and data interface,可直接replace existing products.

(For more information on the performance features and differences between single-frequency and dual-frequency interferometers, please refer to the Solutions section of our website: Dual-frequency Laser Interferometer)