Product Features
High-performance RF power supply.Plasma is more stable; the sliding track structure allows the entire reaction chamber to be in the glow discharge zone..And
Rapid heating and cooling capabilities; as opposed to traditionalCVDCompared to.Lower growth temperature required.
ItemObjective | TypeNumber | TFE - 1200 - 50 - 220 |
Available temperatureDegree | 1150℃ (short-term) | |
RatedTemperature | 1100℃ | |
Recommended warming rate | ≤10℃/min | |
Control PrecisionDegree | ±1℃ | |
Furnace Tube GaugeInch | Φ30/50/60*1200mm | |
Furnace GaugeInch | Φ80*220mm | |
Heating ZoneDegree | 220mm | |
Constant temperature zone length | 80mm | |
AddThermal element | CountryResistive Wire | |
RatedPower | 3KW | |
Supply of GasSystem | ThreeRoad high precisionMFCRange 0-500sccm( customizable ) | |
AmmunitionFrequency Power Supply | RF Power: 5-500WFrequency: 13.56 MHzMHzMatch Type: SelfDynamic Matching | |
VacuumSystem | DoubleHigh-grade Spiral Blade Vacuum Pumps ( customizable to Diffusion Pumps, Molecular Pumps, etc.) | |
外形: AppearanceDimensions | 1250*510*810mm | |
