GD-Profiler 2™ Glow Discharge Spectrometer

Discover a brand new world of information with a Glow Discharge Spectrometer.

The GD-Profiler 2™ rapidly and simultaneously analyzes all elements of interest, including the gas elements N, O, H, and Cl, making it an ideal tool for thin-film and thick-film characterization and process research.

The GD-Profiler 2™ is equipped with a radio frequency source that can test fragile samples in pulse mode. It is widely used in both academic and industrial research laboratories, and its applications include corrosion research, PVD coating process control, PV film development, and LED quality control.

l  The RF generator meets the E-class standard, optimized for stability and sputter坑 shape to ensure real-time surface analysis.

l  RF sources can analyze both traditional and non-traditional coatings and materials, and for fragile samples, pulsed synchronous collection can be used to optimize testing.

l  From 110nm to 800nm, synchronous full spectral coverage, including the deep ultraviolet channel for analysis of H, O, C, N, and Cl.

l  The ion etching holographic gratings developed by HORIBA feature high light throughput and spectral resolution, demonstrating excellent optical efficiency and sensitivity.

l  HDD detector combines speed and sensitivity.

l  The built-in differential interferometer DIP can measure sputter pit depth and erosion rate in real-time.

l  Spacious and simple large sample warehouse for easy sample loading and unloading; operation is straightforward.

l  QUA.N.T.UM™ software is configured with the Tabler report writing tool.

Patented Laser Centering Device (Patent No.: Fr0107986/International Patent Class: )G01N 21/67Locatable sample testing location.

The HORIBA Glow Discharge Spectrometer is available with an optional monochromator, which not only achieves n+1 element channels but also enhances the flexibility of the equipment.

The Huiguang source combines ultra-fast, high-resolution synchronous optical devices, enabling rapid and in-depth elemental analysis of conductors, non-conductors, and composite materials.

Suitable for thin and thick films – ranging from nanometers to hundreds of micrometers, with nanometer-level depth resolution.

Typical application fields include photovoltaic, metallurgy, LED manufacturing, corrosion research, organic and microelectronics, material research and development, deposition process optimization, PVD, CVD, plasma coatings, automotive, and lithium batteries.

No ultra-high vacuum required.

High dynamic range detectors can measure all elements of interest (including H, D, O, Li, Na, C, N, etc.).

Optional accessories, such as the monochromator, are equipped with high-dynamic range detectors, allowing for full-spectrum scans in image mode, significantly enhancing the flexibility of the equipment.

Pulsed RF source, available for operation in both conventional RF mode and pulsed RF mode, with full automatic matching capability.

The Huiguan source employs a differential twin-pump vacuum system, suitable for sample preparation for SEMs.

Built-in plasma cleaning function.

Super-fast sputtering mode UFS for rapid analysis of polymers and organic materials.

Integrated differential interferometer DIP, which allows direct online depth measurement.

l  Various copper anodes and accessories for testing of non-standard samples.

l  Windows 10 Software- Multiple copies for remote installation