Gas Preheated PECVD System
Model: PE1260B-Y
Application: Used to enhance the plasma chemical vapor deposition effect for samples
Specification:
Features: Enhanced by the addition of a gas preheating function to the standard PECVD system, resulting in superior deposition effects.
The PECVD system is designed to lower the reaction temperature in traditional chemical vapor deposition (CVD) by incorporating an RF radio frequency induction device at the front of a standard CVD setup, which ionizes the reaction gas to form a plasma.
Utilizing the reactivity of plasma to enhance the reaction, hence the system is termed a Plasma-Enhanced Chemical Vapor Deposition (PECVD) system.
Key Features:
1. Automatic vacuum balance within the tube—Real-time monitoring and automatic balancing of the tube's vacuum level. The PECVD process requires the vacuum level within the quartz tube to typically be between 0.1～100Pa. The AIO control system of this PECVD model will maintain the vacuum level set by the user through the automatic start and stop of the vacuum pump, ensuring optimal uniformity of the film formation.
2. AIO Control System – Heating Control, Plasma RF Control, Gas Flow Control, and Vacuum System Control all centralized on a single 7-inch touch screen for unified regulation and operation, coordinated control – Chengyi AIO Control System.
3. Scheduled RF Power Control - Pre-set power levels and on/off times for automatic operation.
4. Furnace chamber speed adjustable - Users can set the left and right movement speed and distance of the furnace chamber according to experimental requirements. After deposition, the furnace chamber can automatically move away from the deposition area for rapid sample cooling.
5. Enhanced gas preheating zones to heat the reaction gas to the experimental temperature before ionization, ensuring a more stable deposition effect and reducing the deposition time.
Product Parameters:
| Equipment Name: | Gas Preheated Dual Temperature Zone RECVD System |
| Model: | PE1260B-Y |
| Furnace Mode: | Open Hearth Firing Box |
| Display Mode: | 7-inch touch screen |
| Control System: | Chengyi AIO Intelligent Control System |
| Ultimate Temperature: | 1200℃ |
| Heating Element: | Molybdenum iron-chromium aluminum alloy heating wire |
| Thermosensor Components | Type K Thermocouple |
| Insulation materials: | High-purity alumina fiber |
| Operating Temperature: | ≤1150℃ |
| Rising Temperature Rate: | Suggest 10℃/min |
| Heating Zone: | Dual temperature zone |
| Total temperature zone length: | 200+200 |
| Intake Preheat Temperature: | 800℃ |
| Inlet preheating zone length: | 200mm |
| Boiler Tube Specifications: | 60*1400mm |
| Temperature Control Accuracy: | ±1℃ |
| Sealing Method: | Quick-flange seal |
| Temperature Curve: | 30 customizable "time-temperature curves" |
| Pre-storage Curve: | Pre-store 15 temperature curves |
| The curve illustrates: | Sintering curve displayed in real-time |
| RF Power Supply: | 5-300W Auto Match |
| RF Frequency: | 13.56MHz |
| Vacuum system pumping speed: | 2L/s |
| Vacuum Pump Types: | Two-stage vacuum mechanical pump |
| Ultimate vacuum degree of vacuum pump: | 10-2Pa |
| System vacuum degree: | ≤20Pa |
| Internal Pressure Requirement: | Automatically start and stop the vacuum pump based on user settings to achieve pressure balance. |
| Pressure Protection: | Automatic venting and pressure relief after internal overpressure |
| Supply Gas System | 3-5 Channel Quality Flow Meters |
| Accuracy: | ±1 |
| Gas Types: | Acetylene, hydrogen, nitrogen, carbon dioxide |
| Gas Switching: | According to user settings, the gas can be automatically switched. |
