Delta-X Multi-functional X-ray Diffraction/Radiation Instrument - XRD

Delta-X Multi-functional X-ray Diffraction/Reflectometer

Meets the comprehensive testing requirements of various material systems for scientific research institutions and technology development centers.

Product Introduction

The Delta-X multi-functional X-ray diffraction equipment designed by Jordan Valley Company is versatile for applications in material science research, process development, and production quality control environments. The Delta-X diffractometer can flexibly switch between conventional diffraction mode, high-resolution diffraction mode, and X-ray reflection mode. The optical components of the diffractometer's light source and detection stations can be fully automated, and it features a horizontal sample stage.

The switching of optical configurations is fully automated under menu-driven program control by the computer, eliminating the need for manual operation. The automated switching and alignment do not require specialized personnel or equipment, ensuring that each switch achieves the appropriate optical alignment state.

Routine sample measurements can be partially or even fully automated through the use of the Delta-X diffractometer. The automated measurement programs can be customized specifically to meet customer requirements. The diffractometer can also be operated in a completely manual mode to develop new measurement methods and study new material systems.

Data analysis or fitting can be part of the measurement process, capable of full automation, or conducted separately as needed. For instance, in a semiconductor production line, the RADS and REFS fitting software can be run in an automated mode based on the line's requirements. This allows for routine data analysis to be completed automatically without user interference, directly leading to data fitting and result output. RADS and REFS can also be installed separately for more detailed data analysis.

Product Features

· Automated sample alignment, testing, and data analysis

· Customers can set the level of measurement automation themselves.

· 300mm Eulerian Cradle bracket design, high-precision sample alignment and scanning

· 300mm wafer horizontally placed, with complete mapping

· 100° range of Chi-axis tilt, unrestricted rotation space for the Phi-axis, capable of polar and residual stress testing

· Intelligent optical configuration switching and collimation. Automatically selects the appropriate optical configuration and performs optical collimation based on measurement requirements.

· Robust industrial-grade equipment control and data analysis software

· High-resolution angle gauge for precise and accurate measurement

· High-intensity light source platform design and optical component combination for rapid measurement

· Comprehensive and diverse testing technologies and measurement parameters

· Expertly designed and manufactured by professionals with over 30 years of high-resolution X-ray diffraction experience, with global customer experience.

Product Advantages

Automated optical system with control

The Delta - X diffractometer's incident beam features various standard optical configuration modes, offering ample flexibility and ease of operation. Reference crystals can be selected based on the material type of the measurement sample.

2. Sample Table

The Eulerian ring mount design of the Delta - X diffractometer allows for the placement of a single or multiple wafers or samples, offering precise, high-reproducibility movement control across a wide range of rotation axes.

   · Accepts 300mm diameter wafers or multiple smaller size wafers, samples

   · "Edge-to-Edge Full-Chip Measurement (No Edge Measurement Distortion)"

   · Optional special environment sample stands available, such as high-temperature and vacuum.

3. Detection Station

   · Flashing high-performance point detector, significantly enhancing response characteristics

   · Outstanding Performance Wire Detector (Optional Accessory)

4. Robot Arm Accessories for Automation

Optional fully automated robotic arms for the automatic loading, unloading, and measurement of wafers with a diameter ≤ 300mm.

5. System Control and Data Collection

The Delta - X diffractometer operates in various modes, including menu-driven fully automated measurements, manual alignment, and scanning of individual axes.

   · Create measurement menus with flexibility and ease using the simple wizard.

   · Automatically generates analysis reports, providing real-time information and alerts

6. Professional User Features

Professional users can fully utilize the advanced features of the Delta-X diffractometer. The control software allows for all operation modes, ranging from fully automatic to fully manual alignment and measurement.

   · Manual/Automatic Collimation Program Setup

   · Achieve professional scanning modes in any direction

   · Powerful program script

Application Examples

· High-resolution X-ray diffraction and relaxation degree

Material: Single-crystal substrate materials (such as Si, GaAs, InP, GaN) and epitaxial layer materials, including multilayer epitaxial film structures

Parameters: Epilayer thickness, composition, relaxation, lattice strain, wafer uniformity, lattice mismatch, doping concentration, substrate tilt angle, epitaxial tilt angle.

· Three-axis X-ray diffraction and reciprocal space Map

Material: Single crystal substrate materials (such as Si, GaAs, InP, GaN) and epitaxial layer materials, including multilayer epitaxial films structure

Parameters: Epilayer Thickness, Composition, Relaxation, Lattice Strain, Wafer Uniformity, Lattice Mismatch, Dopant Concentration, Substrate Tilt Angle, Epilayer Inclination.

· High-resolution X-ray diffraction (HRXRD) Data Example

- GaN-based multiple quantum well structure

Grown III-V族 materials on silicon substrates

· X-ray Reflectivity (XRR)

Material Type: Film

Parameters: Film Thickness, Density, Roughness

Scanning Methods: Omega-2Theta Scanning, Omega Scanning, 2Theta Scanning

· X-ray Diffraction (XRD)

Materials: Measurement of polycrystalline materials, nanomaterials, polycrystalline thin films, etc. For ultra-thin layer materials and nanometer-thick film materials, grazing incidence diffraction can be employed.

Parameters: Phase structure, texture, grain size, particle size, unit cell analysis, crystallinity analysis, residual stress measurement.

· Polycrystalline Film X-Ray Diffraction (XRD)

Materials: Measurement of polycrystalline materials, nanomaterials, polycrystalline thin films, etc. For ultra-thin layer materials and nanometer-thick film materials, grazing incidence diffraction can be used.

Parameters: Phase Structure, Lattice Constant, Grain Size

· Polycrystalline Film Grazing Incidence X-ray Diffraction (GI-XRD)

Materials: Measurement of polycrystalline materials, nanomaterials, polycrystalline thin films, etc. For ultra-thin layer materials and nanometer-thick thin film materials, grazing incidence diffraction can be employed.

Parameters: Phase Structure, Texture, Crystallinity

Scanning Mode: 2Theta Scanning (GI - XRD)

· Polar plot of polycrystalline film: Texture determination

Materials: Measurement of polycrystalline materials, nanomaterials, polycrystalline thin films, etc.

Parameters: Texture

Scanning Method: Combined scan of Chi axis and Phi axis

· Residual Stress Measurement of Films

Materials: Measurement of polycrystalline materials, nanomaterials, polycrystalline thin films, etc.

Parameters: Residual Stress

Scanning Method: Joint scan of 2Theta and Chi axes

· X-ray Diffraction Application Examples

Ultra-thin High-K Material

- Residual Stress Measurement of Films

Analysis Software

The Jordan Valley Analysis Software Package boasts over 30 years of experience and is widely used for X-ray characterization of thin film material structures. Built on the foundation of the original analysis software from the now-defunct British Bede Scientific, the Jordan Valley package offers broad applicability and excellence in both research and industrial production fields. It encompasses automated fitting software for high-resolution X-ray diffraction (HRXRD) and X-ray reflectivity (XRR), general analysis software, mapping and analysis software, and more.

- JV RADS: Widely respected and trusted software in the field of industrial production, extensively used for HRXRD data analysis of epitaxial film growth on single crystal substrates.

- JADE: Features robust XRD data analysis capabilities, including the reading, processing, and analysis of diffraction patterns, enabling precise phase identification analysis.

- JV REFS: Software for analyzing X-ray reflection data, featuring easy operation and powerful functions, widely used in R&D and production fields.

- JV Contour: Draw and display 2D or 3D mapping graphics

- JV PeakSplit: Offers various functions for directly analyzing HRXRD and XRD data, graphically presenting HRXRD or XRD measurement data, and fitting peak shape characteristics.

For more data examples or detailed specifications, please contact our company for further information.