Common industrial gases used in semiconductor manufacturing typically include the following:

Nitrogen

Nitrogen, due to its availability, is a core gas used in various steps of semiconductor manufacturing, but its primary use is during the blow-off stage. At this stage, nitrogen is employed to flush each channel and pipeline, removing any oxygen and impurities from the machinery and tools, thereby protecting them from potential contamination by other gases and impurities during the process.

2. Argon

Argon is primarily used in the deposition and etching processes within ultraviolet laser lithography systems, enabling the creation of small patterns on semiconductor chips. During the manufacturing of the required silicon wafers, argon is utilized to protect the silicon crystals formed on the wafer from any potential reactions with oxygen and nitrogen during the high-temperature growth process. As argon is also a highly inert gas, it is used to provide a non-reactive environment for metal sputter deposition. Sometimes, nitrogen's reactivity is too strong, leading to the formation of metal nitrides. Additionally, liquid argon is used in conjunction with tools for cleaning small, fragile chips.