Ion implantation technology is the primary method used in the semiconductor industry for doping semiconductor materials today.Its application ushered in the era of large-scale and ultra-large-scale integrated circuits.

Varian is a world leader in the research of scientific instruments and vacuum products. The 350D ion implanter is a result of over six decades of Varian's innovative patents and military production experience since the invention of the variable speed tube. It boasts excellent beam controllability and output power efficiency comparable to its peers. Even when operating at high energy for extended periods, it maintains outstanding performance.

The Varian 350D boasts the following advantages:

Good controllability: In principle, various elements can be used as admixtures.

High-resolution quality analyzer for pure doping assurance.

Can be doped at room temperature or low temperatures.

Excellent uniformity and repeatability.