Ammonia Gas Oven, Ammonia Vacuum Drying System, Ammonia Graphite Inversion Furnace - Applications:

During the photoresist processing, adjusting its polarity is crucial for achieving accurate graphic transfer. Ammonia, as an effective polarity regulator, plays a pivotal role in photoresists. It allows photoresists to better adapt to the needs of graphic transfer in the manufacturing of semiconductor devices, optical components, and biochips, enhancing product manufacturing quality and precision. By virtue of its unique chemical properties, ammonia plays a vital role in adjusting polarity and optimizing graphic transfer effects in photoresists, making it one of the indispensable key materials in the field of microfabrication.

   Ammonia Vacuum Drying SystemWidely applied in research fields such as new materials (like metamaterials, surface engineering), cutting-edge physics (such as superconductivity, quantum), biomimetics (functional surfaces), photonics (micro-nano optics, photonic waveguides, photonic crystals), biology (DNA testing, nanofluidic), microelectronics, and processing fields including 3D structured optical devices, photonic chips, and high-power chips.

NH3 ammonia gas oven, ammonia gas vacuum baking system, ammonia gas graphic inversion furnace technical specifications:

Capacity: Compatible with 2-12 inch wafers or squares, customizable

Temperature Range: RT - 200℃

Vacuum Degree: ≤100 Pa

Control Instruments: Human-Machine Interface + PLC

Airline Control: Multi-airline control

Vacuum Pump: High-quality Oil-Free Spiral Pump

Protective Devices: NH3 Monitoring Protection, Over-temperature Protection, Leakage Protection, etc.

NH3 ammonia gas drying oven, ammonia gas vacuum baking system, ammonia gas graphic inversion furnace features:

Good reproducibility

Enhanced stability

Environmentally friendly, with significant advantages of being non-harmful to human health

Also suitable for the treatment of other sedimentation processes