Photovoltaic Cell HMDS Treatment System  HMDS Pretreatment Oven  Role of HMDS Vapor Deposition Equipment：

Battery wafer preparation is a critical process in photovoltaic cell production, primarily including steps such as lithography, diffusion, deposition, and metallization.

Photolithography: The photolithography process primarily uses photoresist and a mask to project the required electronic pattern onto the surface of a silicon wafer, and then forms the pattern through processes such as exposure and development.

2. Diffusion: The diffusion process injects impurities (such as phosphorus or boron) into silicon wafers at high temperatures, creating a PN structure that enables the separation of positive and negative charges.

3. Deposition: The deposition process primarily involves treatments such as oxidation, nitration, or sulfuration on the surface of silicon wafers, forming appropriate surface structures and protective layers for the battery sheets.

4. Metalization: The metalization process involves depositing electrical materials (such as aluminum or silver) onto the battery sheet surface through methods like vapor deposition, sputtering, or printing, serving as conductors for current collection and transmission.

In photolithography, surface pretreatment is required prior to coating, specifically an increase in adhesion treatment. Due to the substrate's hydrophilic characteristics, hydrophobic photolithographic resins cannot bond well with hydrophilic wafer surfaces. Wafers that have not been treated with HMDS on the surface are prone to issues like webbing and floating resin in downstream processes, leading to failures in photolithography pattern transfer. Additionally, wet etching is more susceptible to lateral corrosion.

Photovoltaic Cell HMDS Treatment System HMDS Pretreatment Oven HMDS Vapor Deposition Machine Specifications

Primary Method: Vapor Phase Deposition

Process Steps: The HMDS oven starts the coating process after reaching high temperature and achieving a vacuum state. After coating is complete, N2 is filled into the oven, exhaust gases are released, and the door can be opened only after reaching atmospheric pressure.

Temperature Range: RT+10-200℃

Vacuum Level: ≤1 torr

Control Instruments: Human-Machine Interface, Automatic Operation

Reservoir bottle: Standard equipment

Oil-Free Scroll Vacuum Pump

Data Processing: Multiple process options, editable and recordable, with data log capability.

Protective Device: Low-Level AlarmHMDS Leak AlarmOver-temperature protection with heating shutdown, leakage protection, overcurrent protection, etc.

Photovoltaic Cell HMDS Treatment System  HMDS Pretreatment Oven  HMDS Vapor Deposition Machine Manufacturer

JS-HMDS90