Water-cooled High-Temperature PI Oven, Anaerobic Oven, PI Curing, Dust-Free Oxygen-Free Bake Process

The synthesis process for Pi commonly employs a two-step method. The first step involves the condensation of dimeric anhydrides and dimeric amines at low temperatures to produce polyamide PAA. The second step entails cyclization of PAA into Pl via chemical imidization or thermal imidization.

Hydrazination is further divided into solid-phase hydrazination and solution hydrazination. The former, solid-phase hydrazination, is commonly used in the preparation of PI films, where PAA solution is cast into a film and then heated for hydrazination. Solution hydrazination involves adding azeotropic solvent to the PAA solution, heating it to reflux, and using the vaporization of the azeotropic solvent to remove water produced during the reaction, thereby promoting further reaction. At room temperature to 150°C, the primary processes are the removal of oxygen and water; from 150°C to 320°C, the main processes are the volatilization of residual solvents within the film and dehydration cyclization. The second stage is the main temperature range for the reaction and the critical stage for the transition of PAA structure to PI structure. Higher hydrazination temperatures are beneficial for the volatilization of residual solvents within the film and the progression of dehydration cyclization reactions, resulting in PI original films with an orderly structure.

Water-Cooled High-Temperature PI Oven, Anaerobic Oven, PI Curing, Dust-Free Oxygen-Free BakeApplication

Used in semiconductor/electronic/new materials/new energy industries. Curing of BCB, PI, PBO resins, heat treatment of LCP new materials, lithium batteries, and more.

Water-Cooled High-Temperature PI Oven, Anaerobic Oven, PI Curing, Dust-Free Oxygen-Free BakeManual

Dimensions: 90L/150L/210L/500L/Custom Size
Material: Inner cavity made of SUS304/316 stainless steel.
Vacuum Degree: 100 Pa
Temperature Range: RT+50～400℃
Temperature resolution: 0.1℃

Variance: ±0.5℃

Uniformity: ±1.5%℃

Oxygen content: 20 ppm

Nitrogen System: Adjustable Flow Meter + Pressure Reducing Valve

Power Voltage: 380V, 50Hz

Vacuum Pump: Oil-Free Scroll Dry Pump

Operation: Manual or Automatic;

Control Mode: Human-Machine Interface + PLC

Data Recording: Intra-cavity Multi-point Temperature Detection and Recording Function

Cooling Method: Rapid Cooling Device

Heating Method: Stepwise Programmed Heating

Anaerobic ovens, vacuum anaerobic ovens, dust-free ovens, HMDS ovens, sputtering machines, dust-free anaerobic ovens, nitrogen ovens, blow-through vacuum ovens, ultra-low temperature test chambers, rapid temperature change test chambers, constant temperature and humidity test chambers, high and low temperature shock test chambers, and more equipment, as well as customized solutions. --- Professionally produced and serviced by Shanghai Junsi Instrument Co., Ltd.!